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Semiconductor Wafer Processing :Process Equipment :CVD
     

  • ASM 's equipment is engineered for leading-edge processes. Engineering focuses on deposition quality and particle control with high throughput resulting in a low cost of ownership.  

  • ATV Technology, Inc., introduced in 1982 the model PEO-601, Programmable Process Furnace. Its versatility – fast ramp up/down, vacuum capability, multiple program controlled gas lines – was and still is revolutionary in thermal processing. Meanwhile the product family has been growing too and ATV’s products are spread worldwide at the most famous Hybrid , Semiconductor and SMT companies. ATV’s strengths are the customer specific applications and processes. When you have a certain application please challenge us – we will solve your problem.  

  • Genus The Lynx2 advanced single-wafer cluster tool is the latest in a long line of Chemical Vapor Deposition (CVD) high-productivity equipment pioneered by Genus. We have an established history of bringing advanced tools and processes to the marketplace and providing our customers with reliable and innovative solutions. This is your assurance that the Lynx2 will help you respond to changing technology while satisfying your production needs.  


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