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Semiconductor Wafer Processing :Process Equipment :Dry Etch Systems
     

  • AXIC was founded in 1980 to develop unique solutions for analytical and process issues relative to semiconductor manufacturing. The first product was introduced in 1986. This equipment was an x-ray flourescence system for the measurement of thin films for composition and thickness. This unit has been readily accepted by major semiconductor manufacturers. .  

  • Horiba has a reputation for excellence in diverse markets. Our product lines include scientific instruments, from pH meters to time-resolved nanosecond spectrofluorometers, optical crystals for radioactivity detection, air and water pollution monitoring systems, industrial analyzers for quality control, safety, and facility maintenance, and a complete line of emissions testing equipment. .  

  • TePla AG a technology leader for industrial plasma systems. .  

  • Semiconductor Process Equipment Corporation Final Clean, Prediffusion Clean, Oxide Etch, Nitride Etch, Resist Strip, Dewax, Preclean, Postlap, Etch, Tab Removal, Caustic Etch... to name a few of the process systems that our experienced and talented engineers and staff personnel can design and build for you. You may choose from a wide variety of automated robotic transfer systems, various types of baths, custom built passthrough storage cabinets, dryers, transfer carts, work stations, and deionized water heaters, plus different structural materials, in addition to the most state-of-the-art software applications..  


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